发明名称 Photovoltaic device and method for manufacturing the same
摘要 The method includes: steps of forming an n-type diffusion layer having an n-type impurity diffused thereon at a first surface side of a p-type silicon substrate; forming a reflection prevention film on the n-type diffusion layer; forming a back-surface passivation film made of an SiONH film on a second surface of the silicon substrate; forming a paste material containing silver in a front-surface electrode shape on the reflection prevention film; forming a front surface electrode that is contacted to the n-type diffusion layer by sintering the silicon substrate; forming a paste material containing a metal in a back-surface electrode shape on the back-surface passivation film; and forming a back surface electrode by melting a metal in the paste material by irradiating laser light onto a forming position of the back surface electrode and by solidifying the molten metal.
申请公布号 US8722453(B2) 申请公布日期 2014.05.13
申请号 US200913259079 申请日期 2009.04.14
申请人 NAKATANI MITSUNORI;MITSUBISHI ELECTRIC CORPORATION 发明人 NAKATANI MITSUNORI
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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