发明名称 Methods for processing substrates in process systems having shared resources
摘要 Methods for processing substrates in twin chamber processing systems having first and second process chambers and shared processing resources are provided herein. In some embodiments, a method may include providing a substrate to the first process chamber of the twin chamber processing system, wherein the first process chamber has a first processing volume that is independent from a second processing volume of the second process chamber; providing one or more processing resources from the shared processing resources to only the first processing volume of the first process chamber; and performing a process on the substrate in the first process chamber.
申请公布号 US8721798(B2) 申请公布日期 2014.05.13
申请号 US20100916462 申请日期 2010.10.29
申请人 CRUSE JAMES P.;CANTWELL DERMOT;XU MING;HARDY CHARLES;SCHWARZ BENJAMIN;COLLINS KENNETH S.;NGUYEN ANDREW;SUI ZHIFENG;LEE EVANS;APPLIED MATERIALS, INC. 发明人 CRUSE JAMES P.;CANTWELL DERMOT;XU MING;HARDY CHARLES;SCHWARZ BENJAMIN;COLLINS KENNETH S.;NGUYEN ANDREW;SUI ZHIFENG;LEE EVANS
分类号 B08B6/00;C25F5/00 主分类号 B08B6/00
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