| 摘要 |
A quality control apparatus for a gas diffusion layer includes a support, at least one first pressure device, a plate provided below the first pressure device and supporting the pressure applied to the gas diffusion layer sample, a first controller controlling the compression of the first pressure device, a thickness gauge measuring the thickness of the gas diffusion layer sample, a flow channel formed in the sample compressing portion to discharge a gas to the gas diffusion layer sample, a gas supply controller, a gas supply source, a pressure gauge, two fixing devices, a third controller controlling the compression of the fixing devices, two second pressure, a second controller controlling the compression of the second pressure device, a stopper, a protrusion, and a load cell. |
