| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate. |
| 申请公布号 |
US8724083(B2) |
申请公布日期 |
2014.05.13 |
| 申请号 |
US201113082038 |
申请日期 |
2011.04.07 |
| 申请人 |
STREEFKERK BOB;BASELMANS JOHANNES JACOBUS MATHEUS;COX HENRIKUS HERMAN MARIE;DERKSEN ANTONIUS THEODORUS ANNA MARIA;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;LOF JOERI;LOOPSTRA ERIK ROELOF;MERTENS JEROEN JOHANNES SOPHIA MARIA;VAN DER MEULEN FRITS;MULKENS JOHANNES CATHARINUS HUBERTUS;VAN NUNEN GERARDUS PETRUS MATTIJS;SIMON KLAUS;SLAGHEKKE BERNARDUS ANTONIUS;STRAAIJER ALEXANDER;VAN DER TOORN JAN-GERARD CORNELIS;HOUKES MARTIJN;ASML NETHERLANDS B.V. |
发明人 |
STREEFKERK BOB;BASELMANS JOHANNES JACOBUS MATHEUS;COX HENRIKUS HERMAN MARIE;DERKSEN ANTONIUS THEODORUS ANNA MARIA;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;LOF JOERI;LOOPSTRA ERIK ROELOF;MERTENS JEROEN JOHANNES SOPHIA MARIA;VAN DER MEULEN FRITS;MULKENS JOHANNES CATHARINUS HUBERTUS;VAN NUNEN GERARDUS PETRUS MATTIJS;SIMON KLAUS;SLAGHEKKE BERNARDUS ANTONIUS;STRAAIJER ALEXANDER;VAN DER TOORN JAN-GERARD CORNELIS;HOUKES MARTIJN |
| 分类号 |
G03B27/42;G03B27/52;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
