| 摘要 |
A photoacid generator compound has the formula (I):
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ G + Z-€ƒ€ƒ€ƒ€ƒ€ƒ(I)
wherein G has the formula (II):
wherein in formula (II), X is S or I, each R 0 is commonly attached to X and is independently a C 1-30 alkyl group; a polycyclic or monocyclic C 3-30 cycloalkyl group; a polycyclic or monocyclic C 6-30 aryl group; or a combination comprising at least one of the foregoing, G has a molecular weight of greater than 263.4 g/mol, or G has a molecular weight of less than 263.4 g/mol and one or more R 0 groups are further attached to an adjacent R 0 group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3, and Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator and a polymer, and a method of forming an electronic device uses the photoresist. |
