CRYSTAL ORIENTATION CONTROL DEVICE, AND FILM DEPOSITION APPARATUS AND ANNEALING APPARATUS HAVING THE SAME, AND CRYSTAL ORIENTATION CONTROL METHOD

摘要

PROBLEM TO BE SOLVED: To provide a crystal orientation control device for controlling the crystal orientation of a thin film of a ferrodielectric substance filmed on a silicon substrate, and a film deposition apparatus and an annealing apparatus having the device, and a crystal orientation control method.SOLUTION: An annealing apparatus comprises: a film deposition chamber 1 having a heating apparatus 7 capable of heating a ferrodielectric substance to be sputter-filmed on the surface of a silicon substrate 11 opposed to a target 10, to a crystallization temperature or higher; a cooling chamber having cooling devices 20 and 21 adjacent to the film deposition chamber through a gate valve 18 for forcedly cooling the filmed silicon substrate to a Curie temperature of the ferrodielectric substance or lower; and a transport device 3 for transporting the silicon substrate between the film deposition chamber and the cooling chamber.