| 摘要 |
The present invention provides a method for manufacturing a multi-cell by using a photo etching process including a step for molding a multi-cell bipolar plate body with a non-conductive material; a step for applying a photo resist to upper and lower surfaces of the multi-cell bipolar plate body that is molded; a step for forming a boundary portion in the multi-cell bipolar plate body by performing masking, exposure, and development on the photo resist; a step for forming coating layers on the upper and lower surfaces of the multi-cell bipolar plate body by using a conductive material; and a step for removing the coating layers that is formed on the upper and lower surfaces of the boundary portion of the multi-cell bipolar plate body. |
