APPARATUS FOR PROCESSING BUBSTRATE

摘要

According to one embodiment of the present invention, a substrate processing apparatus includes a process chamber which has an inner space for receiving a substrate transferred from the outside and allowing a process for the substrate to be performed therein; a hot-wire heater which is installed along the sidewall of the process chamber, is arranged around the inner space, and heats the substrate; and a cooling tube which is arranged between the wires of the hot-wire heater and installed along the sidewall of the process chamber. A cooling medium supplied from the outside flows through the cooling tube.