| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an apparatus in which measurement can be carried out without affecting plasma and without being affected by sediment, and the plasma state can be estimated during processing.SOLUTION: A plasma processing apparatus processes an object (103) to be processed placed in a processing chamber (101), by generating plasma (108) between electrodes (102-107) in the processing chamber (101). A plurality of antennas (113a, 113b) are provided around an axis (Z) connecting the electrodes (102-107) outside the processing chamber (101), and the state of plasma is estimated by calculating a correlation of antenna outputs by an operation unit (114).</p> |
