| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a magnetron sputtering method in a magnetron sputtering apparatus, for increasing an erosion region in accordance with the enlargement of a target area while minimizing a used amount of a magnet.SOLUTION: A plurality of magnetic induction members (11) are so arrayed in the direction of a rotation axis Ct that at least a portion may be arranged between a rotary magnet and a stationary magnet (38) in a direction to cross the direction of the rotation axis Ct, as viewed from the side of a target (21). The magnetic field of a magnet in a state relatively apart from the target (21) is utilized as one for confining a plasma.</p> |
