发明名称 SURFACE TREATMENT PLATED MATERIAL AND PRODUCTION METHOD OF THE SAME, AND ELECTRONIC COMPONENT
摘要 <p>PROBLEM TO BE SOLVED: To provide a surface treatment plated material in which generation of whisker is suppressed, favorable solderability and low contact resistance are maintained even when being exposed to a high temperature environment, and insertion force of terminal and connector is low.SOLUTION: A surface treatment plated material is a plated material in which a Ni or Ni alloy plating layer, a Ag or Ag alloy plating layer, and a Sn or Sn alloy plating layer are sequentially formed to a metal base, wherein an amount of a Si element that adheres to a surface of the Sn or Sn alloy plating is Si:1×10-6×10mol/cm.</p>
申请公布号 JP2014084476(A) 申请公布日期 2014.05.12
申请号 JP20120232230 申请日期 2012.10.19
申请人 JX NIPPON MINING &amp, METALS CORP 发明人 KODAMA ATSUSHI ; SHIBUYA YOSHITAKA ; FUKAMACHI KAZUHIKO
分类号 C25D5/12;C25D5/48;C25D7/00 主分类号 C25D5/12
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