发明名称 |
SURFACE TREATMENT PLATED MATERIAL AND PRODUCTION METHOD OF THE SAME, AND ELECTRONIC COMPONENT |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a surface treatment plated material in which generation of whisker is suppressed, favorable solderability and low contact resistance are maintained even when being exposed to a high temperature environment, and insertion force of terminal and connector is low.SOLUTION: A surface treatment plated material is a plated material in which a Ni or Ni alloy plating layer, a Ag or Ag alloy plating layer, and a Sn or Sn alloy plating layer are sequentially formed to a metal base, wherein an amount of a Si element that adheres to a surface of the Sn or Sn alloy plating is Si:1×10-6×10mol/cm.</p> |
申请公布号 |
JP2014084476(A) |
申请公布日期 |
2014.05.12 |
申请号 |
JP20120232230 |
申请日期 |
2012.10.19 |
申请人 |
JX NIPPON MINING &, METALS CORP |
发明人 |
KODAMA ATSUSHI ; SHIBUYA YOSHITAKA ; FUKAMACHI KAZUHIKO |
分类号 |
C25D5/12;C25D5/48;C25D7/00 |
主分类号 |
C25D5/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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