发明名称 |
MANUFACTURING METHOD OF SEMICONDUCTOR WAFER AND SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor wafer and a semiconductor device which allow a user to easily identify semiconductor chips.SOLUTION: A pattern is transferred to each of a plurality of shot areas 12 in a semiconductor wafer 10. A plurality of chip areas 14a, 14b are formed in each of the shot areas. A plurality of first dummy patterns 76c, repeatedly arranged in a first embodiment, are formed in the first chip area 14a out of the chip areas in each of the shot areas. A plurality of second dummy patterns 76d, repeatedly arranged in a second embodiment that is different from the first embodiment, are formed in the second chip area 14b out of the chip areas in each of the shot areas. |
申请公布号 |
JP2014086493(A) |
申请公布日期 |
2014.05.12 |
申请号 |
JP20120232799 |
申请日期 |
2012.10.22 |
申请人 |
FUJITSU SEMICONDUCTOR LTD |
发明人 |
SAITO SHOKO;OKADA TOMOYUKI;TAKEUCHI HIROTOKI;NAOE TERUBUMI;MINEMURA MASAHIKO;SATO YOSHIHIRO;KONNO YOSHITO;INADA YASUHIKO;INAOKA TOMOAKI;SAJITA NAOYA |
分类号 |
H01L27/04;G03F7/20;H01L21/66;H01L21/822 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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