发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR WAFER AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor wafer and a semiconductor device which allow a user to easily identify semiconductor chips.SOLUTION: A pattern is transferred to each of a plurality of shot areas 12 in a semiconductor wafer 10. A plurality of chip areas 14a, 14b are formed in each of the shot areas. A plurality of first dummy patterns 76c, repeatedly arranged in a first embodiment, are formed in the first chip area 14a out of the chip areas in each of the shot areas. A plurality of second dummy patterns 76d, repeatedly arranged in a second embodiment that is different from the first embodiment, are formed in the second chip area 14b out of the chip areas in each of the shot areas.
申请公布号 JP2014086493(A) 申请公布日期 2014.05.12
申请号 JP20120232799 申请日期 2012.10.22
申请人 FUJITSU SEMICONDUCTOR LTD 发明人 SAITO SHOKO;OKADA TOMOYUKI;TAKEUCHI HIROTOKI;NAOE TERUBUMI;MINEMURA MASAHIKO;SATO YOSHIHIRO;KONNO YOSHITO;INADA YASUHIKO;INAOKA TOMOAKI;SAJITA NAOYA
分类号 H01L27/04;G03F7/20;H01L21/66;H01L21/822 主分类号 H01L27/04
代理机构 代理人
主权项
地址