发明名称 LASER PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a laser processing method capable of more inexpensively manufacturing a device compared to processing which uses a protective film material such as water-soluble resin.SOLUTION: A laser processing method for performing laser processing for a wafer in which a device is formed in each of the regions partitioned by a plurality of processing schedule lines which cross each other on the surface comprises the steps of: holding a rear surface side of the wafer by holding means (holding step); forming an ice layer covering a surface of the wafer before or after performing the holding step (ice layer forming step); and forming a laser processing groove along the processing schedule lines by irradiating the wafer held by the holding means and covered by the ice layer with a laser beam of a wavelength having absorbability via the ice layer from the surface of the wafer (laser processing step).
申请公布号 JP2014086612(A) 申请公布日期 2014.05.12
申请号 JP20120235378 申请日期 2012.10.25
申请人 DISCO ABRASIVE SYST LTD 发明人 KITAMURA MASAHIKO
分类号 H01L21/301;B23K26/12;B23K26/364 主分类号 H01L21/301
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