发明名称 PHOTOCATALYST RESIN FILM MATERIAL AND JOINING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To perform the joining of a photocatalyst resin film, which is carried out through thermal welding after a photocatalyst layer is shaved off, without damaging a base material.SOLUTION: A photocatalyst resin film material 100 includes a base material 10 prepared by weaving threads and a resin layer 20 covering both surfaces of the base material 10, and further includes a photocatalyst layer 60, an adhesion layer 50 and a plasticizer migration prevention layer 40 on one surface of the resin layer 20. Further, the photocatalyst resin film material 100 has a relatively thick second resin layer 30, formed by laminating resin films, between the plasticizer migration prevention layer 40 and the resin layer 20. Thereby, even when the photocatalyst layer 60 is shaved off, the threads in the base material 10 are prevented from being damaged.
申请公布号 JP2014083751(A) 申请公布日期 2014.05.12
申请号 JP20120233870 申请日期 2012.10.23
申请人 TAIYO KOGYO CORP;HIRAOKA & CO LTD 发明人 TOYODA HIROSHI;AIMONO NOBUTAKA
分类号 B29C65/02;B32B27/12;B32B27/18 主分类号 B29C65/02
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