发明名称 LIQUID DISCHARGE HEAD MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To manufacture a liquid supply port having a good shape by a simple method on a silicon substrate of a liquid discharge head.SOLUTION: A liquid discharge head manufacturing method, in which includes a channel forming member for forming a liquid discharge port and a liquid channel and a silicon substrate for forming a liquid supply port to supply liquid to the liquid discharge port and the liquid channel, comprises a process to prepare the silicon substrate which has a first mask layer formed with an opening and the channel forming member for forming the liquid discharge port and the liquid channel on the first mask layer in a front surface side, and a second mask layer formed with an opening in a rear surface side, and a process forming a liquid supply port on the silicon substrate by supplying etching liquid from the opening formed in the first mask layer and the opening formed in the second mask layer and etching the silicon substrate.
申请公布号 JP2014083772(A) 申请公布日期 2014.05.12
申请号 JP20120234866 申请日期 2012.10.24
申请人 CANON INC 发明人 HATSUI TAKUYA;SAKURAI MAKOTO;TAKEUCHI SOTA;YASUDA KEN;NAGAMOCHI SOICHIRO
分类号 B41J2/16;B41J2/05 主分类号 B41J2/16
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