发明名称 |
MANUFACTURING METHOD OF MASK PATTERN |
摘要 |
PROBLEM TO BE SOLVED: To widen an interval of wiring patterns generated by an automatic layout tool or the like.SOLUTION: A linear part divided from a first wiring pattern in a wiring pattern dividing step S4 and a linear part divided from a second wiring pattern opposing the first wiring pattern at a predetermined interval or closer are disposed in different layers so as not to oppose each other at the predetermined interval or closer in a different layer arrangement step S10. In a pattern combination step S14, the wiring patterns are combined and in a mask data output step S16, mask data are outputted. |
申请公布号 |
JP2014086439(A) |
申请公布日期 |
2014.05.12 |
申请号 |
JP20120231609 |
申请日期 |
2012.10.19 |
申请人 |
FUJITSU SEMICONDUCTOR LTD |
发明人 |
FUKUDA MASATOSHI |
分类号 |
H01L21/82;H01L21/3205;H01L21/768;H01L21/822;H01L23/522;H01L27/04 |
主分类号 |
H01L21/82 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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