发明名称 MOBILE APPARATUS, EXPOSURE EQUIPMENT, AND METHOD FOR MANUFACTURING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To simplify a structure of a wafer stage device including a planar motor.SOLUTION: Exposure equipment includes a wafer stage device 20 having a surface plate 30. The surface plate 30 includes: a mother board 36 having a plurality of output connectors that can be respectively connected to input connectors of a plurality of coil units 50 constituting a planar motor for driving a wafer stage 24, for distributing power to the plurality of coil units 50 via the input and output connectors; and a manifold plate 34 arranged so as to be overlapped with the mother board 36, and having a plurality of second joints that can be respectively connected to first joints of the plurality of coil units 50, for distributing a coolant to the plurality of coil units 50 via the first and second joints. The plurality of coil units 50 are regularly arranged along one surface of the mother board 36.</p>
申请公布号 JP2014087257(A) 申请公布日期 2014.05.12
申请号 JP20130222686 申请日期 2013.10.25
申请人 NIKON CORP 发明人 ARAI YOICHI ; MORIMOTO SHIGE ; MICHEL PHARAND
分类号 H02K41/03;H01L21/027;H01L21/68;H02K5/20;H02K9/19 主分类号 H02K41/03
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