发明名称 SUBSTRATE MANUFACTURING METHOD AND SUBSTRATE MANUFACTURING APPARATUS
摘要 Provided is a method for fabricating a substrate, capable of forming a thin film by taking into consideration of the deformation of the substrate while preventing increase in time occupied by a device and in costs through image data correction. Compressed data, in which image data in a raster format to define the shape of a thin film to be formed on the substrate is compressed, is prepared. The deformation of the substrate in a surface direction is measured. Pixels are inserted into or removed from the compressed data based on the measured deformation without changing the compressed format of the data, thereby generating deformed correction data. The thin film is formed on the substrate based on the generated deformed correction data.
申请公布号 KR20140055978(A) 申请公布日期 2014.05.09
申请号 KR20130114311 申请日期 2013.09.26
申请人 SUMITOMO HEAVY INDUSTRIES, LTD. 发明人 SHIRAISHI TATSURO;OKAMOTO YUJI
分类号 H05K3/28 主分类号 H05K3/28
代理机构 代理人
主权项
地址