| 发明名称 |
AN UNDERLAYER COMPOSITION AND PROCESS THEREOF |
| 摘要 |
The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer. |
| 申请公布号 |
KR20140056178(A) |
申请公布日期 |
2014.05.09 |
| 申请号 |
KR20137032152 |
申请日期 |
2012.06.18 |
| 申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
YAO HUIRONG;LIN GUANYANG;BOGUSZ ZACHARY;LU PINGHUNG;KIM, WOO KYU;NEISSER MARK O. |
| 分类号 |
C08L101/06;C08K5/56;C08L33/04;C08L37/00;G03F7/00;H01L51/00 |
主分类号 |
C08L101/06 |
| 代理机构 |
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