发明名称 GAS INTRODUCTION DEVICE AND INDUCTION COUPLING PLASMA PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a mounting structure of a ceramic component used in a processing apparatus that can avoid occurrence of problems due to heat as much as possible.SOLUTION: A gas introduction adapter 10A has a hollow adapter body 121, and a fixing structure 122 for fixing the adapter body 121 to a first partial wall 6A. The fixing structure 122 has a holder 123 for holding the upper flange 121a of the adapter body 121, a ring-shaped male screw 124 as a first fastening member, a nut 125 as a second fastening member, and a spacer 126 secured to the periphery of the adapter body 121 on the upper surface of the first partial wall 6A. The holder 123 thermally expands in the direction opposite from the nut 125 and spacer 126 when heating, and functions as stress relaxation means for relaxing stress of the adapter body 121.
申请公布号 JP2014082250(A) 申请公布日期 2014.05.08
申请号 JP20120227736 申请日期 2012.10.15
申请人 TOKYO ELECTRON LTD 发明人 HEMMI ATSUSHI;SAEGUSA NAOYA
分类号 H01L21/3065;C23C16/455;C23C16/507 主分类号 H01L21/3065
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