发明名称 METHOD AND DEVICE FOR MEASURING SURFACE ROUGHNESS OF DEPOSITED THIN FILM
摘要 <p>The present invention relates to a method for measuring surface roughness of a deposited thin film. The method for measuring surface roughness of a deposited thin film, according to the present invention, comprises the steps of: receiving picked-up images for a surface of a deposited thin film which is imaged by using an optical microscope, wherein the picked-up images are respectively received according to each of a plurality of source powers applied to the optical microscope; obtaining accumulated particle number distributions indicative of accumulated particle numbers in respective gray scale values by using the number of pixels corresponding to the respective gray scale values in the picked-up images; searching for a gray scale value corresponding to a value preceding a gray scale value in which overlapping of the accumulated particle numbers initially occurs in at least two distributions, among the accumulated particle number distributions obtained according to the respective picked-up images; and calculating surface roughness of a deposited thin film according to the respective picked-up images by obtaining accumulated particle numbers in the retrieved gray scale value according to the respective picked-up images.</p>
申请公布号 WO2014069962(A1) 申请公布日期 2014.05.08
申请号 WO2013KR09915 申请日期 2013.11.05
申请人 INDUSTRY-ACADEMIA COOPERATION GROUP OF SEJONG UNIVERSITY 发明人 KIM, BYUNG WHAN;SEO, JUN HYUN
分类号 H01L21/66 主分类号 H01L21/66
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