| 摘要 |
A substrate processing device comprising: a substrate processing unit for processing a substrate; a storage unit for storing a plurality of recipes representing processing conditions; and a control unit having a main control unit for effecting a prescribed processing of a substrate by controlling the substrate processing unit on the basis of the recipes stored in the storage unit, and a user interface unit for accessing the main control unit, wherein the control unit includes a recipe optimizing means that calculates the difference between measurement data acquired by measuring results of processing the substrate, and a target value, and optimizes the recipe by modifying a part of the processing condition of the recipe so that the difference becomes smaller, and a recipe batch-optimizing means that retrieves from the storage unit the recipes which can be optimized by batch in relation to the recipe being optimized by the recipe optimizing means, and modifies a part of the processing condition for the retrieved recipes along with the recipe being optimized. |
