发明名称 SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To prevent the contamination of a substrate by particles as much as possible, in a substrate transfer apparatus.SOLUTION: A diffusion prevention cover 221 acts so that particles generated in a slide section of a connection slider 203 and a guide 201b may not be diffused into an external transfer space. Both the interval between an upper wall section 221a of the diffusion prevention cover 221 and an upper surface 203a of the connection slider 203 and the interval between a side wall section 221b of the diffusion prevention cover 221 and a side surface 203b of the connection slider 203 are formed narrowly, and form a narrow passage in which particles cannot be diffused into the external substrate transfer space.
申请公布号 JP2014082529(A) 申请公布日期 2014.05.08
申请号 JP20140026280 申请日期 2014.02.14
申请人 TOKYO ELECTRON LTD 发明人 KOMADA HIDEKI
分类号 H01L21/677 主分类号 H01L21/677
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