发明名称 PELLICLE
摘要 PROBLEM TO BE SOLVED: To provide a pellicle which can allow the width of a pellicle frame to be narrowed to the minimum to secure the largest exposed area, but cannot allow the pellicle frame to be deformed when the pellicle is produced or transported and the film of which is not wrinkled but can be stuck to a photomask with desired dimensional precision.SOLUTION: The pellicle frame has a double-layer structure of an inner frame and an outer frame. The inner frame stretches and holds the pellicle film and has a mask tacky-adhesive layer. The outer frame is stuck fast to the inner frame but can be separated from the inner frame.
申请公布号 JP2014081454(A) 申请公布日期 2014.05.08
申请号 JP20120228582 申请日期 2012.10.16
申请人 SHIN ETSU CHEM CO LTD 发明人 SEKIHARA KAZUTOSHI
分类号 G03F1/64 主分类号 G03F1/64
代理机构 代理人
主权项
地址