| 发明名称 |
REFLECTIVE MASK AND METHOD FOR MANUFACTURING THE SAME |
| 摘要 |
A reflective mask includes a substrate and a multilayer reflective film formed on the substrate. An absorption pattern is formed on the multilayer reflective film. A recess is formed in the multilayer reflective film in a peripheral region of the absorption pattern. |
| 申请公布号 |
US2014127613(A1) |
申请公布日期 |
2014.05.08 |
| 申请号 |
US201314066398 |
申请日期 |
2013.10.29 |
| 申请人 |
FUJITSU SEMICONDUCTOR LIMITED |
发明人 |
KAGAWA TAKESHI |
| 分类号 |
G03F1/24 |
主分类号 |
G03F1/24 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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