SUBSTRATE MANUFACTURING APPARATUS

摘要

A stage (13) holds a substrate (15) on which a thin film is to be formed. A nozzle head (20) discharges droplets of a thin film material toward the substrate held by means of the stage. A material supply system (40) supplies the liquid-state thin film material to the nozzle head. A heating apparatus (42) heats at least a part of the material supply system. A cooling mechanism (60) cools the nozzle head. A heat transfer inhibiting structure (32) inhibits heat transfer from a heating space (33) having the material supply system disposed therein to a cooling space (34) having the nozzle head disposed therein. In this substrate manufacturing apparatus, an excessive temperature increase of the nozzle head can be suppressed.