| 摘要 |
PROBLEM TO BE SOLVED: To provide methods for making tools for conditioning polishing pads that reduce or minimize the corrosive effects and for using the same.SOLUTION: A method for manufacturing an abrasive tool for conditioning a CMP pad, the method comprising: coating a CMP conditioner that includes abrasive grains coupled to a substrate via a metal bond, by a process comprising: a) positioning the CMP conditioner in a vacuum deposition chamber; b) and depositing a composition containing carbon, silicon, oxygen, hydrogen, and fluorine onto it by co-deposition of cluster-less particle beams that include ions, atoms, or radicals of the carbon, silicon, oxygen, hydrogen, and fluorine, wherein the mean free path of each particle species is in excess of the distance between its source and a growing particle coating surface of the conditioner. |
