发明名称 ANTIFUSE OF SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
摘要 An antifuse of a semiconductor device and a method of fabricating the same capable of causing an antifuse to stably operate by rupturing the antifuse at a specific point and stabilizing a current level when rupturing the antifuse are provided. The antifuse may include: a device isolation layer defining a first active region in a semiconductor substrate; a first and second junction regions provided in the first active region; a second active region formed over the first junction region; a gate insulating layer formed over the first active region and the second active region; and a gate electrode formed over the gate insulating layer.
申请公布号 US2014124864(A1) 申请公布日期 2014.05.08
申请号 US201213714353 申请日期 2012.12.13
申请人 SK HYNIX INC. 发明人 HONG YEONG EUI
分类号 H01L29/78;H01L29/66 主分类号 H01L29/78
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