发明名称 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND ELECTRONIC DEVICE
摘要 <p>A photosensitive resin composition containing: an alkali-soluble resin (A); a phenolic resin (B) that is obtained by reacting a phenolic compound expressed by general formula (1) and an aromatic aldehyde compound expressed by general formula (2) in the presence of an acid catalyst; and a photoacid generator (C). [Chemical formula 1] (In the formula: R1 represents an organic group selected from the group consisting of alkoxy groups and alkyl groups having 1-20 carbon atoms; and p is an integer of 1-3.) [Chemical formula 2] (In the formula: R2 represents hydrogen or an organic group selected from the group consisting of alkoxy groups, hydroxy groups, and alkyl groups having 1-20 carbon atoms; and q is an integer of 0-3.)</p>
申请公布号 WO2014069091(A1) 申请公布日期 2014.05.08
申请号 WO2013JP73542 申请日期 2013.09.02
申请人 SUMITOMO BAKELITE CO., LTD. 发明人 TANAKA YUMA;ONISHI OSAMU;IMAMURA YUJI;IWAI MASAHIRO
分类号 G03F7/023;C08G8/04;C08G69/00;G03F7/004;G03F7/075;H01L21/027 主分类号 G03F7/023
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