发明名称 |
Method for producing silicon fine particles and method for controlling particle diameter of silicon fine particles |
摘要 |
The present invention addresses the aims and problems of providing a method of producing silicon fine particles and a method of controlling the particle size of silicon fine particles, which enable silicon fine particles having a uniform particle size to be efficiently produced. The present invention is characterized in that silicon particles are immersed in an etching solution, a light having greater energy than the band gap energy of the silicon particles is irradiated onto the silicon particles immersed in the etching solution, and thereby silicon fine particles with a smaller particle size than the silicon particles are produced while controlling the particle size. |
申请公布号 |
AU2011299789(B2) |
申请公布日期 |
2014.05.08 |
申请号 |
AU20110299789 |
申请日期 |
2011.09.09 |
申请人 |
BRIDGESTONE CORPORATION |
发明人 |
SATO, SEIICHI;MIYANO, MARI;ENDO, SHIGEKI;SHIINO, OSAMU;ONO, SHINGO;YOSHIKAWA, MASATO |
分类号 |
C01B33/025 |
主分类号 |
C01B33/025 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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