SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM

摘要

PROBLEM TO BE SOLVED: To appropriately form a prescribed pattern on a substrate in substrate processing which uses a block copolymer containing a hydrophilic polymer and a hydrophobic polymer.SOLUTION: A method for processing a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer comprises the steps of: forming a neutral layer having intermediate affinity to the hydrophilic polymer and the hydrophobic polymer on the substrate (step S2); forming a resist pattern by performing exposure processing for a resist film formed on the substrate and developing the resist film after exposure processing (step S3); processing a surface of the resist pattern by supplying an organic solvent having a polarity to the resist pattern (step S5); and applying the block copolymer onto the neutral layer and phase-separating the block copolymer on the neutral layer into the hydrophilic polymer and the hydrophobic polymer (step S7).