| 摘要 |
<p>PROBLEM TO BE SOLVED: To position, in high precision, a mask rotated around a first axis and a drum rotated around a second axis.SOLUTION: Multiple first standard marks are configured on both sides of a pattern region on the outer circumferential plane of a mask along the circumferential direction thereof, whereas multiple second standard marks are configured on the outer circumferential plane of a drum along the circumferential direction thereof in correspondence respectively to the multiple first standard marks. The provided apparatus includes an illumination system for forming, via exposure beams, an illuminated region on the outer circumferential plane of the mask, a projection optical system for forming, within an image formation region atop an inductive substrate, an image of a pattern within the illuminated region, and a first detection system for detecting both images of first standard marks formed via the projection optical system after beams emitted from the first standard marks illuminated by the illumination system have been reflected, via the projection optical system, by the outer circumferential plane of the drum and images of second standard marks formed via the projection optical system by beams emitted from the second standard marks illuminated, via the projection optical system, by the illumination system.</p> |
