发明名称 HEMT with Compensation Structure
摘要 A high electron mobility transistor includes a source, a gate and a drain, a first III-V semiconductor region, and a second III-V semiconductor region below the first III-V semiconductor region. The high electron mobility transistor further includes a compensation structure interposed between the first and second III-V semiconductor regions so that the first and second III-V semiconductor regions are spaced apart from one another by the compensation structure. The compensation structure has a different band gap than the first and second III-V semiconductor regions.
申请公布号 US2014124791(A1) 申请公布日期 2014.05.08
申请号 US201414155926 申请日期 2014.01.15
申请人 INFINEON TECHNOLOGIES AUSTRIA AG 发明人 CURATOLA GILBERTO;HÄBERLEN OLIVER
分类号 H01L29/778;H01L27/06;H01L29/66 主分类号 H01L29/778
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