发明名称 |
PHOTORESIST REDUCTION SYSTEM |
摘要 |
<p>The present invention relates to a photoresist reduction system. The photoresist reduction system according to one embodiment of the present invention includes a first container (1) which receives photoresist; a first buffer tank (2) which detects air bubbles included in the photoresist; a first pressing gas injection pipe (3); a first connection pipe (4); a second buffer tank (7); a second pressing gas injection pipe (8); a second connection pipe (9); a manifold (13); a discharge pipe (14) connected to the manifold (13); and a control part (18). According to one embodiment of the present invention, the control part (18) opens a second bent vale (10) and a third valve (17b).</p> |
申请公布号 |
KR101392842(B1) |
申请公布日期 |
2014.05.08 |
申请号 |
KR20140041156 |
申请日期 |
2014.04.07 |
申请人 |
AIOKOREA CO., LTD. |
发明人 |
SIN, DONG HUN;JO, GYEONG MAN;BAK, JAE HYEON;KIM, JEONG GI |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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