PROCESS MONITORABLE APPARATUS FOR PROCESSING SUBSTRATE AND METHOD OF PROCESS MORNITORING USING THE SAME

摘要

The present invention relates to a substrate processing apparatus for monitoring a process and a method of monitoring a process using the same. The present invention relates to a substrate processing apparatus for monitoring a process which forms an exhaust line connected to a residual gas analyzer and a high vacuum pump connected to a process chamber, controls the vacuum level of the residual gas analyzer by the exhaust line connected to the residual gas analyzer, and analyzes the leakage of the process chamber and gas components, and a method of monitoring a process using the same.