发明名称 |
A METHOD AND APPARATUS FOR PROCESS CONTROL IN TIME DIVISION MULTIPLEXED (TDM) ETCH PROCESSES |
摘要 |
<p>The present invention provides a method for controlling pressure in a chamber during a time division multiplexed process. A throttle valve is positioned based on an open-loop pressure control algorithm within at least one step of the time division multiplexed etch process. A pressure response of the step is evaluated and compared to a desired pressure response. The throttle valve is then positioned through a proportional, integral and derivative controller step to step of the time division multiplexed etch process based on the evaluation to the desired pressure response.</p> |
申请公布号 |
EP1897127(B1) |
申请公布日期 |
2014.05.07 |
申请号 |
EP20050764277 |
申请日期 |
2005.06.30 |
申请人 |
UNAXIS USA INC. |
发明人 |
WESTERMAN, RUSSELL;TEIXEIRA, MIKE;JOHNSON, DAVID;LAI, SHOULIANG |
分类号 |
H01L21/3065;G05D16/20;H01J37/32;H01L21/00 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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