发明名称
摘要 A pattern forming method includes: forming a layer of a block copolymer, including at least two kinds of polymers, on a substrate; heating the block copolymer layer; irradiating UV light on the heated block copolymer layer; and supplying a developing solution to the UV light-irradiated block copolymer layer.
申请公布号 JP5484373(B2) 申请公布日期 2014.05.07
申请号 JP20110029138 申请日期 2011.02.14
申请人 发明人
分类号 H01L21/027;B82Y40/00;H01L21/3065 主分类号 H01L21/027
代理机构 代理人
主权项
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