| 摘要 |
There is provided a substrate mounting table capable of accurately measuring a temperature of a wafer supported on the substrate mounting table without incurring contamination within a chamber and without forming a hole for measuring a temperature in the substrate mounting table. The substrate mounting table includes a mounting surface 90a configured to mount a wafer W thereon; a substrate lifting unit 80 configured to lift the wafer W by a lift pin 84 from the mounting surface 90a; and a light irradiating/receiving unit 87 configured to irradiate a measurement light beam 88 as a low-coherence light beam to the wafer W through an inside of the lift pin 84 serving as an optical path and receive reflected light beams from a front surface and a rear surface of the wafer W. The light irradiating/receiving unit 87 is fixed to a base plate 86 of the substrate lifting unit 80. |
