发明名称 |
METHOD FOR PREPARATION OF SYNTHETIC VITREOUS SILICA |
摘要 |
<p>A production method of synthetic silica glass according to the present invention comprises a first step of ejecting a silicon compound and a combustion gas containing oxygen and hydrogen from a burner to effect hydrolysis of the silicon compound in oxyhydrogen flame to produce fine particles of silica glass, and thereafter depositing and vitrifying the fine particles of silica glass on a target opposed to the burner to obtain a synthetic silica glass ingot; a second step of heating the synthetic silica glass ingot or the like obtained in the first step up to a first retention temperature of not less than 900 DEG C, retaining the ingot or the like at the first retention temperature, and cooling the ingot or the like at a temperature decrease rate of not more than 10 DEG C/h down to a temperature of not more than 500 DEG C; and a third step of heating the synthetic silica glass ingot or the like obtained in the second step up to a second retention temperature of not less than 500 DEG C nor more than 1100 DEG C, retaining the ingot or the like thereat, and thereafter cooling the ingot or the like at a temperature decrease rate of not less than 50 DEG C/h down to a temperature 100 DEG C lower than the second retention temperature. <IMAGE></p> |
申请公布号 |
EP1134197(B1) |
申请公布日期 |
2014.05.07 |
申请号 |
EP20000950065 |
申请日期 |
2000.08.11 |
申请人 |
NIKON CORPORATION |
发明人 |
YAJIMA, SHOUJI;HIRAIWA, HIROYUKI;ISHIDA, YASUJI |
分类号 |
C03B19/14;C03B8/04;C03B25/02;C03B32/00;C03C3/06;C03C23/00 |
主分类号 |
C03B19/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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