发明名称 METHOD FOR PREPARATION OF SYNTHETIC VITREOUS SILICA
摘要 <p>A production method of synthetic silica glass according to the present invention comprises a first step of ejecting a silicon compound and a combustion gas containing oxygen and hydrogen from a burner to effect hydrolysis of the silicon compound in oxyhydrogen flame to produce fine particles of silica glass, and thereafter depositing and vitrifying the fine particles of silica glass on a target opposed to the burner to obtain a synthetic silica glass ingot; a second step of heating the synthetic silica glass ingot or the like obtained in the first step up to a first retention temperature of not less than 900 DEG C, retaining the ingot or the like at the first retention temperature, and cooling the ingot or the like at a temperature decrease rate of not more than 10 DEG C/h down to a temperature of not more than 500 DEG C; and a third step of heating the synthetic silica glass ingot or the like obtained in the second step up to a second retention temperature of not less than 500 DEG C nor more than 1100 DEG C, retaining the ingot or the like thereat, and thereafter cooling the ingot or the like at a temperature decrease rate of not less than 50 DEG C/h down to a temperature 100 DEG C lower than the second retention temperature. <IMAGE></p>
申请公布号 EP1134197(B1) 申请公布日期 2014.05.07
申请号 EP20000950065 申请日期 2000.08.11
申请人 NIKON CORPORATION 发明人 YAJIMA, SHOUJI;HIRAIWA, HIROYUKI;ISHIDA, YASUJI
分类号 C03B19/14;C03B8/04;C03B25/02;C03B32/00;C03C3/06;C03C23/00 主分类号 C03B19/14
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