发明名称 |
Method to enhance charge trapping |
摘要 |
Methods of improving charge trapping are disclosed. One such method includes forming an oxide-nitride-oxide tunnel stack and a silicon nitride layer on the oxide-nitride-oxide tunnel stack. This silicon nitride layer is implanted with ions. These ions may function as electron traps or as fields. The silicon nitride layer may be part of a flash memory device. |
申请公布号 |
US8716155(B2) |
申请公布日期 |
2014.05.06 |
申请号 |
US201213610322 |
申请日期 |
2012.09.11 |
申请人 |
RAMAPPA DEEPAK A.;SHIM KYU-HA;VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
RAMAPPA DEEPAK A.;SHIM KYU-HA |
分类号 |
H01L21/469 |
主分类号 |
H01L21/469 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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