发明名称 |
Inductively coupled plasma source as an electron beam source for spectroscopic analysis |
摘要 |
A single column inductively coupled plasma source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the ICP to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis. |
申请公布号 |
US8716673(B2) |
申请公布日期 |
2014.05.06 |
申请号 |
US201113306032 |
申请日期 |
2011.11.29 |
申请人 |
ROUTH, JR. BRIAN ROBERTS;FEI COMPANY |
发明人 |
ROUTH, JR. BRIAN ROBERTS |
分类号 |
H01J49/08;H01J37/30;H01J49/10 |
主分类号 |
H01J49/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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