发明名称 Inductively coupled plasma source as an electron beam source for spectroscopic analysis
摘要 A single column inductively coupled plasma source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the ICP to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.
申请公布号 US8716673(B2) 申请公布日期 2014.05.06
申请号 US201113306032 申请日期 2011.11.29
申请人 ROUTH, JR. BRIAN ROBERTS;FEI COMPANY 发明人 ROUTH, JR. BRIAN ROBERTS
分类号 H01J49/08;H01J37/30;H01J49/10 主分类号 H01J49/08
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