发明名称 Plasma reactor with adjustable plasma electrodes and associated methods
摘要 Plasma reactors with adjustable plasma electrodes and associated methods of operation are disclosed herein. The plasma reactors can include a chamber, a workpiece support for holding a microfeature workpiece, and a plasma electrode in the chamber and spaced apart from the workpiece support. The plasma electrode has a first portion and a second portion configured to move relative to the first portion. The first and second portions are configured to electrically generate a plasma between the workpiece support and the plasma electrode.
申请公布号 US8715519(B2) 申请公布日期 2014.05.06
申请号 US201313774772 申请日期 2013.02.22
申请人 MICRON TECHNOLOGY, INC. 发明人 HARRINGTON DANIEL
分类号 G01L21/30;G01R31/00 主分类号 G01L21/30
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