发明名称 |
Substrate processing methods for reflectors |
摘要 |
A substrate processing method may include forming a plasma; extracting ions from the plasma and accelerating the ions to have uniform or substantially uniform directivity using a grid system; irradiating the ions at a reflector, wherein the reflector includes a plurality of reflecting plates each having a metal plate and an insulating layer on the metal plate, wherein the reflecting plates are parallel or substantially parallel such that the insulating layers are exposed to the ions; reflecting the ions incident on the reflecting plates away from the insulating layers of the reflecting plates; colliding the ions reflected away from the insulating layers with the metal plates to convert the ions into neutral beams; and irradiating the neutral beams onto a substrate to process the substrate. |
申请公布号 |
US8715472(B2) |
申请公布日期 |
2014.05.06 |
申请号 |
US20100659331 |
申请日期 |
2010.03.04 |
申请人 |
HWANG SUNG-WOOK;SHIN CHUL-HO;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HWANG SUNG-WOOK;SHIN CHUL-HO |
分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|