发明名称 |
Electron beam writing apparatus and position displacement amount correcting method |
摘要 |
The present invention provides an electron beam writing apparatus and an image placement error correcting method each capable of calculating a high-accuracy correction amount relative to an image placement error in consideration of a difference in required unit area of height distribution data between the shape of a back surface of an EUV mask and the shape of a surface of a pin chuck. Of back surface shape data of the EUV mask necessary to perform an image placement error correction of each pattern, the back surface shape data of a position brought into contact with each pin of the pin chuck is extracted. The image placement error is calculated only from the extracted back surface shape data. |
申请公布号 |
US8718972(B2) |
申请公布日期 |
2014.05.06 |
申请号 |
US20090419642 |
申请日期 |
2009.04.07 |
申请人 |
YOSHITAKE SHUSUKE;NUFLARE TECHNOLOGY, INC. |
发明人 |
YOSHITAKE SHUSUKE |
分类号 |
G01C9/00;G01J1/00;G03F1/22;G03F1/24;H01L21/027 |
主分类号 |
G01C9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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