发明名称 |
Calculating a laser metric within a lithographic apparatus and method thereof |
摘要 |
Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate. |
申请公布号 |
US8717540(B2) |
申请公布日期 |
2014.05.06 |
申请号 |
US201113019365 |
申请日期 |
2011.02.02 |
申请人 |
KÖHLER CARSTEN ANDREAS;VAN DER LAAN HANS;STAALS FRANK;DE WINTER LAURENTIUS CORNELIUS;GODFRIED HERMAN PHILIP;ASML NETHERLANDS B.V. |
发明人 |
KÖHLER CARSTEN ANDREAS;VAN DER LAAN HANS;STAALS FRANK;DE WINTER LAURENTIUS CORNELIUS;GODFRIED HERMAN PHILIP |
分类号 |
G03B27/54;G03B27/32 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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