发明名称 METHOD AND APPARATUS FOR GENERATING RADIATION.
摘要 A radiation source (e.g., LPP— laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.
申请公布号 NL2011533(A) 申请公布日期 2014.05.06
申请号 NL20132011533 申请日期 2013.10.01
申请人 ASML NETHERLANDS B.V. 发明人 GREEVENBROEK HENDRIKUS;BADIE RAMIN;BANINE VADIM;DIJKSMAN JOHAN;KEMPEN ANTONIUS;YAKUNIN ANDREI;WINKELS KOEN GERHARDUS
分类号 G03F7/20;H05G2/00 主分类号 G03F7/20
代理机构 代理人
主权项
地址