发明名称 APPARATUS FOR ALIGNING AND COOLING A SUBSTRATE FOR LASER LIFT OFF
摘要 Provided is a substrate aligning and cooling device for the laser lift off process. A pre-aligning unit performs a preliminary alignment process based on the flat zones of substrates to be processed, which have been discharged from a cassette for accommodating multiple substrates by a loading unit. A cooling unit cools down the substrates discharged by a chamber unit having multiple susceptors by the loading unit and performing different processing on the substrates loaded on the susceptors based on the location of each susceptors, and includes at least one substrate-mounting unit on which the substrates are mounted, a coolant unit which is installed behind the substrate-mounting unit and discharges coolants, and at least one discharging slit. The substrate aligning and cooling device for the laser lift off process according to an embodiment of the present invention is capable of preventing the substrates from being damaged due to the thermal stress and increasing the processing yield rate by simultaneously performing the substrate cooling process for the laser lift off-processed substrates and a new batch of the laser lift off process to cool down heat taking place during the processes in a gradual manner.
申请公布号 KR20140051499(A) 申请公布日期 2014.05.02
申请号 KR20120116273 申请日期 2012.10.18
申请人 DNA CO., LTD. 发明人 KIM, DAE JIN;CHO, WOON KI;EOM, SEUNG HWAN
分类号 H01L21/68;H01L21/302;H01L21/683;H01L33/00 主分类号 H01L21/68
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