发明名称 Substratgenomgående vior
摘要 <p>Method of making through-substrate-vias in glass substrates includes providing a first substrate on which a plurality of needles protruding vertically from the substrate are made; providing a second substrate made of glass; locating the substrates adjacent each other such that the needles on the first substrate face the second substrate; applying heat to a temperature where the glass softens, by heating the glass or the needle substrate or both; applying a force such that the needles on the first substrate penetrate into the glass to provide impressions in the glass; and finally, removing the first substrate and providing material filling the impressions in the second substrate made of glass. A device includes a silicon substrate having a cavity in which a MEMS component is accommodated, and a cap wafer made of a material having a low dielectric constant, and through substrate vias of metal, is bonded to the silicon substrate.</p>
申请公布号 SE1251236(A1) 申请公布日期 2014.05.02
申请号 SE20120051236 申请日期 2012.11.01
申请人 SILEX MICROSYSTEMS AB 发明人 EDVARD KÄLVESTEN;ULF ERLESAND
分类号 H01L21/768;B81B1/00;B81C1/00;H01L21/48;H01L23/48;H01L23/538 主分类号 H01L21/768
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