| 摘要 |
Exhaust systems for substrate process chambers are provided herein. In some embodiments, an exhaust for a process chamber configured to process a substrate having a given width may include a body having an internal cavity and an opening disposed in a first side of the body, the opening fluidly coupled to the internal cavity; a plurality of through holes disposed through a second side of the body, the plurality of through holes fluidly coupled to the internal cavity, wherein the plurality of through holes are disposed symmetrically about the body with respect to a central axis of the body such that the plurality of through holes provide an equal length and pressure drop from the opening to each respective through hole; and a plurality of conduits, each having a first open end respectively coupled to the plurality of through holes. |
