METHOD FOR SEPARATING IMPURITIES IN CMP WASTEWATER AND APPARATUS FOR SEPARATING IMPURITIES IN CMP WASTEWATER USING SAME

摘要

The present invention relates to a method for separating impurities in CMP wastewater and an apparatus for separating impurities in CMP wastewater using same. Specifically, the present invention includes: a step of adding magnetite to the CMP wastewater generated during a semiconductor device chemical mechanical polishing (CMP) process treatment and then stirring the CMP wastewater; a step of adding a coagulant to the CMP wastewater so as to coagulate the impurities present in the CMP wastewater and then stirring the CMP wastewater; a step of adding an acidity controller to the CMP wastewater, controlling the potential of hydrogen in the CMP wastewater to a preset range, and generating a first coagulated material; and a step of separating the first coagulated material generated in the CMP wastewater from the CMP wastewater by using a magnetic field. The method for separating the impurities in the CMP wastewater and the apparatus for separating the impurities in the CMP wastewater using same according to the present invention can generate the coagulant containing silica and a copper ion by adding the coagulant and the acidity controller to the CMP wastewater, and easily filter the magnetic coagulated material from the CMP wastewater by using the magnetic field.